free-electron-laser

Paper	Title	Other Keywords	Page
WECHY01	Status and Prospects of the Novosibirsk FEL Facility	electron, undulator, radiation, laser	133
	N. Vinokurov, E. N. Dementyev, B. A. Dovzhenko, A. A. Galt, Ya. V. Getmanov, B. A. Knyazev, E. I. Kolobanov, V. V. Kubarev, G. N. Kulipanov, L. E. Medvedev, S. V. Miginsky, L. A. Mironenko, V. K. Ovchar, B. Z. Persov, V. M. Popik, T. V. Salikova, M. A. Scheglov, S. S. Serednyakov, O. A. Shevchenko, A. N. Skrinsky, V. G. Tcheskidov, M. G. Vlasenko, P. Vobly, N. S. Zaigraeva BINP SB RAS, Novosibirsk
	Multiturn energy recovery linacs (ERL) looks very promising for making ERLs less expensive and more flexible, but have serious intrinsic problems. At this time only one multiturn ERL exists. This Novosibirsk ERL operates with two orbits and two free electron lasers now. The Novosibirsk terahertz radiation user facility provides 0.5 kW average power at 50 - 240 micron wavelength range. Different users work at six stations. Two another orbits and third free electron laser are under construction. The operation experience revealed specific problems of ERLs(especially, of multiturn ones). Some solutions were proposed recently.
	Slides
WEPSB003	Proposal for an Accelerator Complex for Extreme Ultraviolet Nanolithography Using kW-scale FEL Light Source	radiation, electron, laser, undulator	178
	E. Syresin, N. Balalykin, U. A. Budagov, I. F. Lensky, A. G. Olshevsky, G. Shirkov, A. P. Sumbaev, G. V. Trubnikov JINR, Dubna, Moscow Region M. V. Yurkov DESY, Hamburg
	The project is aimed at construction of accelerator complex, based on a 0.7 GeV superconducting linear accelerator, for applications in nanoindustry, mainly for extreme ultraviolet lithography using kW-scale Free Electron Laser (FEL) light source. The project involves construction of a 0.7 GeV superconducting linear accelerator to produce coherent FEL radiation for extreme ultraviolet nanolithography at a wavelength of 13.5 nm and an average radiation power of 0.5 kW. The application of kW-scale FEL source permits realizing EUV lithography with 22 nm, 16 nm resolutions and beyond. The project for construction of an accelerator complex for EUV lithography is based on the technology realized on FEL FLASH (Free Electron Laser in Hamburg) facility at DESY (Hamburg).
THCHA02	Recovery Process Stability Study in Energy Recovery Accelerator	linac, electron, microtron, coupling	283
	V. G. Kurakin LPI, Moscow
	Energy recovery technique in rf accelerator based applications allows to save rf power and reduce radioactive background as well. In this operation mode used beam is directed back to the accelerator in decelerating rf phase and returns back its kinetic energy to rf field. Thus, rf generator that feeds linac covers cavities walls rf losses only and those part of beam kinetic energy that is used for useful effects production as well. Vector sum of three fields – induced in the linac by an external rf source, accelerated and decelerated beams – determines energy and phase of the beam at linac exit, and together with beam return path optics amplitude and phase of decelerated bunches and hence third component of mentioned sum. In the case of positive sign of this feedback and sufficient amplification in the closed loop just described instability takes place. The main equations that determine beam-rf cavity interaction in energy recovery rf accelerator are derived, single mode approximation being used. Expressions for small deviation from steady state are obtained followed by stability analysis. Results of calculation for increments of instability presented and discussed.
	Slides