| Paper | Title | Other Keywords | Page |
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| TUPOT008 | Performance of the LBNL AECR-U with a TWTA | plasma, ion, resonance, ion-source | 133 |
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The Advanced Electron Cyclotron Resonance - Upgrade ion source (AECR-U) at the Lawrence Berkeley National Laboratory has successfully utilized double frequency microwave heating (14.3 GHz and 10.4 GHz) for several years [1]. Recently a traveling wave tube amplifier (TWTA), providing frequencies in the range of 10.75GHz-12.75GHz, was added as a secondary heating frequency, replacing the previous 10.4 GHz Klystron. The TWTA opens the possibility to explore a wide range of secondary frequencies and a study has been conducted to understand and optimize its coupling into the AECR-U. In particular, the reflected power dependence on heating frequency has been mapped out with and without the presence of plasma. A comparison is made to determine how the presence of plasma, confinement fields, and other source parameters affect the reflected power and if and how the amount of reflected power can be correlated to the source ion beam performance.
[1] Z. Q. Xie and C. M. Lyneis, Rev. Sci. Instrum. 66 (1995). |
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Poster TUPOT008 [0.213 MB] | ||
| WECOAK01 | Characterization of the Microwave Coupling to the Plasma Chamber of the LBL ECR Ion Source. | plasma, cavity, ECR, ion | 162 |
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| The characteristics of the microwave coupling of the 6.4 GHz ECR ion source were measured as a function of frequency, input power and time dependence. In addition the plasma diamagnetism and bremsstrahlung could be measured to help quantify the time dependence of the plasma build up and energy content. The LBL ECR plasma chamber, which has a diameter to wavelength ratio of 1.9 is not as over-moded as the 14 GHz AECR-U, which has a ratio greater than 3. This makes it possible to locate frequencies, where a single RF mode is predominately excited. For one of these modes we were able to demonstrate that with no plasma in the cavity, it is over-coupled and as the power is increased, the plasma density rises and the plasma loading increases it becomes under-coupled. By measuring the ratio of the incident to reflected power it is possible to show the microwave electric field levels saturate with increasing power. In the paper, the time dependence of the plasma loading and plasma diamagnetism as a function of input power and time are analyzed. The measurements of the plasma loading also provide insight into the dynamics of microwave heating in a multimode cavity. | |||
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Slides WECOAK01 [1.593 MB] | ||