<?xml version="1.0" encoding="UTF-8"?>
<xml>
  <records>
    <record>
       <contributors>
          <authors>
             <author>Benjamin, C.</author>
             <author>Burt, G.</author>
             <author>Conlon, J.A.</author>
             <author>Leicester, N.L.</author>
             <author>Malyshev, O.B.</author>
             <author>Marks, H.S.</author>
             <author>Seal, D.J.</author>
             <author>Smith, L.G.P.</author>
             <author>Valizadeh, R.</author>
          </authors>
       </contributors>
       <titles>
          <title>
             Deposition and Characterisation of V₃Si films for SRF Applications
          </title>
       </titles>
       <publisher>JACoW Publishing</publisher>
       <pub-location>Geneva, Switzerland</pub-location>
		 <isbn>2673-5504</isbn>
		 <isbn>978-3-95450-234-9</isbn>
		 <electronic-resource-num>10.18429/JACoW-SRF2023-MOPMB011</electronic-resource-num>
		 <language>English</language>
		 <pages>84-87</pages>
       <keywords>
          <keyword>cavity</keyword>
          <keyword>SRF</keyword>
          <keyword>site</keyword>
          <keyword>target</keyword>
          <keyword>vacuum</keyword>
       </keywords>
       <work-type>Contribution to a conference proceedings</work-type>
       <dates>
          <year>2023</year>
          <pub-dates>
             <date>2023-09</date>
          </pub-dates>
       </dates>
       <urls>
          <related-urls>
              <url>https://doi.org/10.18429/JACoW-SRF2023-MOPMB011</url>
              <url>https://jacow.org/srf2023/papers/mopmb011.pdf</url>
          </related-urls>
       </urls>
       <abstract>
          A15 superconducting materials, like V₃Si and Nb₃Sn, are potential alternatives to Nb for next generation thin film SRF cavities when operated at 4 K. Their relatively high Tc and superconducting properties could allow for higher accelerating gradients and elevated operating temperatures. We present work on the deposition of V₃Si thin films on planar Cu substrates and an open structure 6 GHz cavity, using physical vapour deposition (PVD) and a V₃Si single target. The surface structure, composition and DC superconducting properties of two planar samples were characterised via secondary electron microscopy (SEM), energy dispersive x-ray spectroscopy (EDX) and in a magnetic field penetration facility. Furthermore, the first deposition using PVD of a V₃Si film on a 6 GHz split cavity and the RF performance is presented.
       </abstract>
    </record>
  </records>
</xml>
