| Title |
High-performance Thin-film Niobium Produced via Chemical Vapor Deposition (CVD) |
| Authors |
- R.D. Porter, D.L. Hall, M. Liepe, J.T. Maniscalco
Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
- V.M. Arrieta, S.R. McNeal, W.E. Williams
Ultramet, Pacoima, California, USA
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| Abstract |
Bulk niobium cavities have been the standard for superconducting particle accelerators for many years. However, the cost of high RRR niobium start materials makes them expensive. The use of Chemical Vapor Deposition (CVD) processing technologies to produce thin Nb films on low-cost substrates (e.g. copper) offers a method to significantly reduce the cost of accelerator cavity fabrication while increasing cavity performance capabilities. Recent optimization of CVD niobium processes for high RRR Nb films has led to RF performance approaching that of bulk Nb. In collaboration with Ultramet, Cornell continues to explore the potential of CVD techniques. This paper presents results from a detailed study of CVD thin film Nb materials produced by Ultramet on 5-inch diameter copper and molybdenum substrates, including RF performance results with T-mapping and detailed surface analysis of performance limiting regions. Our work shows that CVD-based cavity fabrication methods are a promising alternative to sheet-formed bulk cavities, and to other thin Nb film techniques, warranting further development. Additional results from the field will be discussed.
|
| Paper |
download WEXA03.PDF [6.527 MB / 7 pages] |
| Slides |
download WEXA03_TALK.PDF [1.503 MB] |
| Export |
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| Conference |
SRF2017, Lanzhou, China |
| Series |
International Conference on RF Superconductivity (18th) |
| Proceedings |
Link to full SRF2017 Proccedings |
| Session |
Fundamental-non Nb II |
| Date |
19-Jul-17 08:00–10:40 |
| Main Classification |
SRF Technology R&D |
| Sub Classification |
Cavity |
| Keywords |
niobium, ion, cavity, SRF, electron |
| Publisher |
JACoW, Geneva, Switzerland |
| Editors |
Volker RW Schaa (GSI, Darmstadt, Germany); Yuan He (IMP, Lanzhou, China); Lu Li (IMP, Lanzhou, China); Ning Zhao (IHEP, Beijing, China) |
| ISBN |
978-3-95450-191-5 |
| Published |
January 2018 |
| Copyright |
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