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'Journal of Accelerator Conferences Website' (JACoW) is a publisher in Geneva, Switzerland that publishes the proceedings of accelerator conferences held around the world by an international collaboration of editors.


https://doi.org/10.18429/JACoW-SAP2023-TUPB035
Title Recent Progress of the Beam Background Experiment in the BEPCII
Authors
  • B. Wang, H.Y. Shi, C.H. Yu
    IHEP, Beijing, People’s Republic of China
Abstract The Beijing Electron Positron Collider II will upgrade to extend the beam energy and the luminosity by increasing the beam current and slightly compressing the beam size, where the beam energy will be extended from 2.3 GeV to 2.8 GeV and the peak luminosity will be up to 1.1×10³³\rm{cm}⁻²\rm{s}⁻¹ at the optimizing beam energy of 2.35 GeV. The BEPCII upgrade is expected to result in challenging levels of beam related background in the interaction region. An precise simulating and mitigating beam background is necessary to protect the BESIII detector and increase the beam current and peak luminosity. The beam related background at BEPCII is mainly from the Touschek effect and the beam gas effect, this paper presents the recent progress of the beam background simulation and experiment.
Paper download TUPB035.PDF [0.671 MB / 3 pages]
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Conference SAP2023
Series Symposium on Accelerator Physics (14th)
Location Xichang, China
Date 10-12 July 2023
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Volker RW Schaa (GSI, Darmstadt, Germany); Wenhui Huang (TUB, Beijing, China); Xueqing Yan (PKU, Beijing, China); Chuanxiang Tang (TUB, Beijing, China); Lu Li (IMP, Lanzhou, China)
Online ISBN 978-3-95450-265-3
Received 06 July 2023
Revised 09 July 2023
Accepted 11 July 2023
Issued 22 July 2024
DOI doi:10.18429/JACoW-SAP2023-TUPB035
Pages 155-157
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 4.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.