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https://doi.org/10.18429/JACoW-SAP2023-MOPB026
Title Physical Design for EEHG Beamlines at S3FEL
Authors
  • X.F. Wang
    Institute of Advanced Science Facilities, Shenzhen, People’s Republic of China
  • C. Feng, Z. Wang
    SARI-CAS, Pudong, Shanghai, People’s Republic of China
  • X.M. Li, J.T. Sun, Y. Yu
    DICP, Dalian, Liaoning, People’s Republic of China
  • Y.F. Liang, X.M. Yang, H. Yi, L. Zeng, W.Q. Zhang
    IASF, Shenzhen, Guangdong, People’s Republic of China
Abstract The proposed Shenzhen Superconducting Soft X-Ray Free-electron Laser (S3FEL) aims at generating FEL pulses from 1 nm to 30 nm. At phase-I, two undulator beamlines work at ehco-enable harmonic generation (EEHG) principle. The two undulators will cover the spectral ranges 2.3-15 nm (~83-539 eV) and 5-30 nm (~41-248 eV), respectively, when receiving electrons from 2.5 GeV superconducting linac. However, the generated FEL radiation is sensitive to various electron beam properties, e.g., its energy profile influenced by collective effects such as Coherent Synchroton Radiation (CSR), especially at high harmonics. To generate intense full coherent FEL radiation at ultra-short wavelength, a novel technique of EEHG cascaded harmonic lasing method is also considered. Physical design and FEL performance are described in this paper.
Funding Work supported by the National Key R&D Program of China (Grant No.2018YFE0203000) and the National Natural Science Foundation of China (Grant No.22288201).
Paper download MOPB026.PDF [2.190 MB / 4 pages]
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Conference SAP2023
Series Symposium on Accelerator Physics (14th)
Location Xichang, China
Date 10-12 July 2023
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Volker RW Schaa (GSI, Darmstadt, Germany); Wenhui Huang (TUB, Beijing, China); Xueqing Yan (PKU, Beijing, China); Chuanxiang Tang (TUB, Beijing, China); Lu Li (IMP, Lanzhou, China)
Online ISBN 978-3-95450-265-3
Received 10 July 2023
Revised 11 July 2023
Accepted 18 July 2023
Issued 04 October 2024
DOI doi:10.18429/JACoW-SAP2023-MOPB026
Pages 55-58
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 4.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.