Yue, S.P. Chang, G.C. Hou, Q. Ji, B. Li, M. JACoW Publishing Geneva, Switzerland 2673-5520 978-3-95450-250-9 10.18429/JACoW-MEDSI2023-TUOBM05 English 24-27 focusing laser target electron interface Contribution to a conference proceedings 2024 2024-07 https://doi.org/10.18429/JACoW-MEDSI2023-TUOBM05 https://jacow.org/medsi2023/papers/tuobm05.pdf The multilayer Laue lens (MLL) is a promising optical element with large numerical aperture and aspect ratio in synchrotron radiation facility. Two multilayers with 63(v)×43(h) ¿m2 aperture and focal spot size of 8.1(v)×8.1(h)nm2 at 10keV are fabricated by a 7-meter-long Laue lens deposition machine. Ultrafast laser etching, dicing and FIB are used to fabricate the multilayer into two-dimensional lenses meeting the requirement of diffraction dynamics. The multilayer grows flat without distortion and shows an amorphous structure characterized by TEM and SAED. The smallest accumulated layer position error is below ±5 nm in the whole area and the rms error is about 2.91nm by SEM and image processing. The focusing performance of MLL with actual film thickness is calculated by a method based on the Takagi¿Taupin description (TTD). The full width at half maximum(FWHM) of focus spot is 8.2×8.4 nm2 which is close to the theoretical result.