<xml>
  <records>
    <record>
       <contributors>
          <authors>
             <author>Hardin, C.L.</author>
             <author>Cocco, D.</author>
             <author>Lee, L.</author>
             <author>Morton, D.S.</author>
             <author>Ng, M.L.</author>
             <author>Zhang, L.</author>
          </authors>
       </contributors>
       <titles>
          <title>
             Using Resistive Element Adjustable Length (REAL) Cooling to Increase Optical Design Flexibility in High Power XFELS
          </title>
       </titles>
		 <publisher>JACoW Publishing</publisher>
       <pub-location>Geneva, Switzerland</pub-location>
       <abstract>
          With the onset of high power XFELs and diffraction limited storage rings, there is a growing demand to maintain sub nanometer mirror figures even under high heat load. This is a difficult issue as the optimum cooling design for an optic is highly dependent on the power footprint on the mirror, which can be highly dynamic. Resistive Element Adjustable Length cooling can be utilized to change the cooling parameters during an experiment to adapt for changing beam parameters. A case study of the new soft x-ray monochromator for the LCLS L2SI program is presented that utilizes this new capability to allow the beam to translate across the mirror for different operation modes, greatly simplifying the monochromator mechanics.
       </abstract>
    </record>
  </records>
</xml>
