<xml>
  <records>
    <record>
       <contributors>
          <authors>
             <author>Eggenstein, F.</author>
             <author>Bischoff, P.</author>
             <author>Erko, A.</author>
             <author>Schäfers, F.</author>
             <author>Senf, F.</author>
             <author>Sokolov, A.</author>
             <author>Zeschke, T.</author>
          </authors>
       </contributors>
       <titles>
          <title>
             The Tripod Unit 6 Axes High Precision Sample Adjustment in UHV
          </title>
       </titles>
		 <publisher>JACoW Publishing</publisher>
       <pub-location>Geneva, Switzerland</pub-location>
       <abstract>
          At BESSY-II we have recently set up a new UV- and XUV optics beamline *,** with an in-house developed versatile reflectometer *** for at-wavelength metrology on reflective and diffractive live sized optical elements up to 4 kg load. High precision measurements of the reflection and polarization properties are feasible by a 360° azimuthal rotation of the sample around the beam of light, where samples can be adjusted reproducibly with a novel UHV-Tripod within arcsec and µm precision. By the tripod the sample is adjustable in 6 degree of freedom: Translations Tx,Ty an Tz and rotations Rx,Ry and Rz while the goniometers rotate the tripod. The two years of operation of the tripod system helped to develop a new tripod geometry for better performance. A new tripod design is presented and compared to the existing system.
       </abstract>
    </record>
  </records>
</xml>
