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https://doi.org/10.18429/JACoW-LINAC2018-TUPO048
Title Study Progress of Pulse Laser Annealing for Niobium Film on Copper
Authors
  • Y. Yang, B.T. Li, X.Y. Lu, W.W. Tan, L. Xiao, D. Xie, D.Y. Yang
    PKU, Beijing, People’s Republic of China
Abstract The recent studies of laser annealing on niobium films on copper are reported. Annealing is normally used to deal with the surface, reducing defects and even chang-ing the microstructure of the coating film. Short pulse laser can produce a sharp step temperature field on the film thickness scale (μm), which anneals the surface without substrate heated. The laser annealing experi-ments of niobium thin film sample have been carried out, and according to SEM and FIB results, Nb films melted and recrystallization occurred. Grains growing up can be observed while the power density of laser pulse in-creased.
Funding Work supported by Major Research Plan of National Natural Science Foundation of China (No. 91026001).
Paper download TUPO048.PDF [1.645 MB / 4 pages]
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Conference LINAC2018
Series Linear Accelerator Conference (29th)
Location Beijing, China
Date 16-21 September 2018
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Guoxi Pei (IHEP, Beijing, China); Volker RW Schaa (GSI, Darmstadt, Germany); Yong Ho Chin (KEK, Tsukuba, Japan); Shinian Fu (IHEP, Beijing, China); Ning Zhao (IHEP, Beijing, China)
Online ISBN 978-3-95450-194-6
Online ISSN 2226-0366
Received 12 September 2018
Accepted 21 September 2018
Issue Date 18 January 2019
DOI doi:10.18429/JACoW-LINAC2018-TUPO048
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.