MOPS055

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URL	https://doi.org/10.18429/JACoW-IPAC2025-MOPS055
Title	Magnet assembly of IVUE32 in-vacuum-APPLE II at BESSY II
Authors	J. Bahrdt, C. Kuhn, E. Rial, J. Bakos, S. Gottschlich, S. Grimmer Helmholtz-Zentrum Berlin für Materialien und Energie A. Meseck Johannes Gutenberg University Mainz F. Boergermann, J. Weickhmann, J. Dreikorn, M. Bergmann, U. Rohrmann Vacuumschmelze GmbH & Co. KG S. Gaebel Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy
Abstract	At HZB / BESSY II the first in-vacuum APPLE II undu-lator is under construction. The design includes three magnet arrays for each of the four magnet rows for an efficient force compensation. The support and drive sys-tem has been delivered. Currently the magnets for the 10-period prototype are fabricated by Vacuumschmelze. Within the project IVUE32 a new soldering technique based on reactive foils has been developed in collabora-tion with Vacuumschmelze. The magnet structure of the IVUE32 undulator will employ the soldering technique aiming for enhanced assembly simplicity. Two new ex-perimental setups for the characterization of soldered subassemblies have been built for obtaining stress-strain curves and for lifetime (fatigue) tests. These instruments will be presented and measurements will be discussed.
Paper	download: MOPS055.pdf
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Conference	16th International Particle Accelerator Conference
Series
Location	Taipei, Taiwan
Date	01-06 Jun 2025
Publisher	JACoW Publishing, Geneva, Switzerland
Editorial Board	* Ming-Chyuan Lin - National Synchrotron Radiation Research Center * Yoichi Sato - KEK * Jui-Che Huang - National Synchrotron Radiation Research Center * David Button - Australian Nuclear Science and Technology Organisation * Ping-Shun Chuang - National Synchrotron Radiation Research Center
Online ISBN	978-3-95450-248-6
Online ISSN	2673-5490
Received	19 May 2025
Revised	04 June 2025
Accepted	05 June 2025
Issued	05 November 2025
DOI	10.18429/JACoW-IPAC2025-MOPS055
Pages	741-744
Copyright	Published by JACoW Publishing under the terms of the Creative Commons Attribution 4.0 license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.