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https://doi.org/10.18429/JACoW-IPAC2021-WEPAB390
Title High-Quality, Conformal Bellows Coatings Using Ultra-Fast HiPIMS with Precision Ion Energy Control
Authors
  • T.J. Houlahan, I. Haehnlein, W.M. Huber, B.E. Jurczyk, I.A. Shchelkanov, R.A. Stubbers
    Starfire Industries LLC, Champaign, USA
Abstract In this paper we demonstrate a replacement for traditional ’wet’ chemical deposition processes using a vacuum, ionized physical vapor deposition (iPVD) process that results in a conformal metal film, capable of coating complex, convoluted parts that are common in modern particle accelerators (e.g., bellows, RF cavities). Results are presented for a process utilizing the combined deposition and etching that are achieved using ultra-fast high-power impulse magnetron sputtering (HiPIMS) coupled with precision control of the ion energy using a positive voltage reversal. This process results in a conformal film and has been used to coat both test coupons and full bellows assemblies. The resulting Cu films, which are 5-10 µm in thickness, exhibit excellent adhesion. Further, they have been shown to tolerate temperature extremes ranging from 77 K to a 400 C vacuum bakeout as well as extreme plastic deformation of the substrate without any buckling, cracking, or delamination.
Funding This material is based upon work supported by the U.S. Department of Energy under Award Number DE-SC0020481.
Paper download WEPAB390.PDF [1.758 MB / 4 pages]
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Conference IPAC2021
Series International Particle Accelerator Conference (12th)
Location Campinas, SP, Brazil
Date 24-28 May 2021
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Liu Lin (LNLS, Campinas, Brazil); John M. Byrd (ANL, Lemont, IL, USA); Regis Neuenschwander (LNLS, Campinas, Brazil); Renan Picoreti (LNLS, Campinas, Brazil); Volker R. W. Schaa (GSI, Darmstadt, Germany)
Online ISBN 978-3-95450-214-1
Online ISSN 2673-5490
Received 19 May 2021
Accepted 02 July 2021
Issue Date 31 August 2021
DOI doi:10.18429/JACoW-IPAC2021-WEPAB390
Pages 3626-3629
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.