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https://doi.org/10.18429/JACoW-IPAC2021-WEPAB263
Title Complex Unit Lattice Cell for Low-Emittance Synchrotrons
Authors
  • Z.L. Ren, Z.H. Bai, J.J. Tan, L. Wang, H. Xu, P.H. Yang
    USTC/NSRL, Hefei, Anhui, People’s Republic of China
Abstract To reach the real diffraction-limited emittance, it is generally required to increase the number of bends in multi-bend achromat (MBA) lattices that are used in the designs of fourth-generation synchrotron light sources. For an MBA lattice with distributed chromatic correction, more bends mean much tighter space and much stronger magnets. Inspired by the hybrid MBA lattice concept, in this paper we propose a new lattice concept called complex unit lattice cell, which can save space and reduce magnet strengths. A 17BA lattice based on the complex unit cell concept is designed for a 3 GeV synchrotron light source with a circumference of 537.6 m, which reaches a natural emittance of about 21 pm·rad. Comparison is also made between this 17BA lattice and the 17BA lattice with distributed chromatic correction to demonstrate the merit of the complex unit cell concept.
Paper download WEPAB263.PDF [0.534 MB / 3 pages]
Poster download WEPAB263_POSTER.PDF [1.279 MB]
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Conference IPAC2021
Series International Particle Accelerator Conference (12th)
Location Campinas, SP, Brazil
Date 24-28 May 2021
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Liu Lin (LNLS, Campinas, Brazil); John M. Byrd (ANL, Lemont, IL, USA); Regis Neuenschwander (LNLS, Campinas, Brazil); Renan Picoreti (LNLS, Campinas, Brazil); Volker R. W. Schaa (GSI, Darmstadt, Germany)
Online ISBN 978-3-95450-214-1
Online ISSN 2673-5490
Received 16 May 2021
Accepted 02 July 2021
Issue Date 12 August 2021
DOI doi:10.18429/JACoW-IPAC2021-WEPAB263
Pages 3254-3256
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.