| Title |
The Status of a Grating Monochromator for Soft X-Ray Self-Seeding Experiment at SHINE |
| Authors |
- K.Q. Zhang
SSRF, Shanghai, People’s Republic of China
- H.X. Deng, C. Feng, B. Liu, T. Liu
SARI-CAS, Pudong, Shanghai, People’s Republic of China
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| Abstract |
The research status of a grating monochromator for soft X-ray self-seeding experiment at SHINE has been presented in this paper. The monochromator system includes the vacuum cavity, optical elements, and mechanical movement devices. Until now, the vacuum cavity has finished the manufactured process completely, the optical mirrors have finished machining and measured by the longitudinal trace profiler (LTP) and atomic force microscope (AFM). To make sure the monochromator system can achieve an optical resolution of 1/10000 at the photon energy of 700-1300eV, the system has been integrated and tested recently. In this year, the previous online experiment will be performed in the shanghai soft X-ray free-electron laser (FEL) user facility.
|
| Paper |
download TUPAB072.PDF [1.539 MB / 4 pages] |
| Poster |
download TUPAB072_POSTER.PDF [0.717 MB] |
| Export |
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| Conference |
IPAC2021 |
| Series |
International Particle Accelerator Conference (12th) |
| Location |
Campinas, SP, Brazil |
| Date |
24-28 May 2021 |
| Publisher |
JACoW Publishing, Geneva, Switzerland |
| Editorial Board |
Liu Lin (LNLS, Campinas, Brazil); John M. Byrd (ANL, Lemont, IL, USA); Regis Neuenschwander (LNLS, Campinas, Brazil); Renan Picoreti (LNLS, Campinas, Brazil); Volker R. W. Schaa (GSI, Darmstadt, Germany) |
| Online ISBN |
978-3-95450-214-1 |
| Online ISSN |
2673-5490 |
| Received |
11 May 2021 |
| Accepted |
09 June 2021 |
| Issue Date |
01 September 2021 |
| DOI |
doi:10.18429/JACoW-IPAC2021-TUPAB072 |
| Pages |
1532-1535 |
| Copyright |
 Published by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI. |
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