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https://doi.org/10.18429/JACoW-IPAC2019-WEPMP012
Title Beam Loss and the Stripping Efficiency Measurement for CSNS Injection System
Authors
  • M.Y. Huang, S. Wangpresenter, S.Y. Xu
    IHEP, Beijing, People’s Republic of China
Abstract The injection beam loss is the main beam loss of the rapid cycling synchrotron (RCS) for the China Spallation Neutron Source (CSNS). After the optimization of injection system during the beam commissioning, the current injection beam loss for CSNS/RCS is approximately 1%. There are several sources of injection beam loss. In order to distinguish these different sources, the stripping efficiency of the main stripping foil should be studied and measured accurately. In this paper, a scheme for the accurate measurement of the stripping efficiency for CSNS will be proposed and studied. It can not only reduce the injection beam loss, but also be used to estimate the operation state and lifespan of the main stripping foil accurately. This method will be applied in future beam commissioning.
Funding Work supported by National Natural Science Foundation of China (Project No. U1832210)
Paper download WEPMP012.PDF [0.752 MB / 3 pages]
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Conference IPAC2019
Series International Particle Accelerator Conference (10th)
Location Melbourne, Australia
Date 19-24 May 2019
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Mark Boland (UoM, Saskatoon, SK, Canada); Hitoshi Tanaka (KEK, Tsukuba, Japan); David Button (ANSTO, Kirrawee, NSW, Australia); Rohan Dowd (ANSTO, Kirrawee, NSW, Australia); Volker RW Schaa (GSI, Darmstadt, Germany); Eugene Tan (ANSTO, Kirrawee, NSW, Australia)
Online ISBN 978-3-95450-208-0
Received 30 April 2019
Accepted 21 May 2019
Issue Date 21 June 2019
DOI doi:10.18429/JACoW-IPAC2019-WEPMP012
Pages 2329-2331
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.