| Title |
Development of a Pulsed Power Supply Utilizing 13 kV Class SiC-MOSFET |
| Authors |
- K. Okamura, F. Naito, K. Takayama
KEK, Ibaraki, Japan
- K. Fukuda, H. Kitai, K. Sakamoto
AIST, Tsukuba, Ibaraki, Japan
- T. Kaito
Chiba Institute of Technology, Narashino, Chiba, Japan
- D. Kumamoto
Nagaoka University of Technology, Nagaoka, Niigata, Japan
- S. Lim, A. Tokuchi
Pulsed Power Japan Laboratory Ltd., Kusatsu-shi Shiga, Japan
|
| Abstract |
To resolve the drawback of conventional thyratron switches, development of a semiconductor high voltage switch utilizing a 13 kV class SiC-MOSFET developed by Tsukuba Power Electronics Constellations (TPEC) is proceeding. At first, the device evaluation test was carried out with a resistive load circuit. With the conditions of drain voltage of 10 kV and load resistance of 1 kΩ, turn on loss Eon, turn off loss Eoff, rise time Tr and fall time Tf were 1.7 mJ, 1.1 mJ, 64 ns, and 75 ns, respectively. As to gate charge characteristics, required electric charge to increase gate source voltage from 0 V to 20 V was about 80 nC. Thereafter, the 2s-12p switch array was designed and assembled, where 12 MOSFETs are equally aligned on a circle shaped circuit board and two circuit boards are stacked in series. A 14 kV-490 A-5 us pulse with a rise time of 430 ns in the long pulse mode and a 18 kV-318 A-1 us pulse with a rise time of 289 ns in the short pulse mode were successfully demonstrated. This switch will be installed as a turn-off switch for the injec-tion ES kicker in the KEK-DA.
|
| Funding |
A part of this work has been implemented under a joint research project of Tsukuba Power Electronics Constellation (TPEC). |
| Paper |
download FRXXPLM3.PDF [4.138 MB / 4 pages] |
| Slides |
download FRXXPLM3_TALK.PDF [5.088 MB] |
| Export |
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| Conference |
IPAC2019 |
| Series |
International Particle Accelerator Conference (10th) |
| Location |
Melbourne, Australia |
| Date |
19-24 May 2019 |
| Publisher |
JACoW Publishing, Geneva, Switzerland |
| Editorial Board |
Mark Boland (UoM, Saskatoon, SK, Canada); Hitoshi Tanaka (KEK, Tsukuba, Japan); David Button (ANSTO, Kirrawee, NSW, Australia); Rohan Dowd (ANSTO, Kirrawee, NSW, Australia); Volker RW Schaa (GSI, Darmstadt, Germany); Eugene Tan (ANSTO, Kirrawee, NSW, Australia) |
| Online ISBN |
978-3-95450-208-0 |
| Received |
15 May 2019 |
| Accepted |
21 May 2019 |
| Issue Date |
21 June 2019 |
| DOI |
doi:10.18429/JACoW-IPAC2019-FRXXPLM3 |
| Pages |
4364-4367 |
| Copyright |
 Published by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI. |
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