| Title |
Long Lifetime Spin-Polarized GaAs Photocathode Activated by Cs2Te |
| Authors |
- J. Bae, L. Cultrera, P. Digiacomo
Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
- I.V. Bazarov
Cornell University, Ithaca, New York, USA
|
| Abstract |
High intensity and highly spin-polarized electron source is of great interest to the next generation Electron Ion Colliders. GaAs prepared by the standard activation method, which is the most widely used spin-polarized photocathode, is notorious for its vacuum sensitivity and short operational lifetime. To improve the lifetime of GaAs photocathodes, we activated GaAs by Cs2Te, a material well known for its robustness. We confirmed the Cs2Te layer forms negative electron affinity on GaAs with a factor of 5 improvement in lifetime. Furthermore, the new activation method had no adverse effect on spin-polarization. Considering Cs2Te forms much thicker activation layer (~ 2 nm) compared to the standard activation layer (~ monolayer), our results trigger a paradigm shift on new activation methods with other robust materials that were avoided for their thickness.
|
| Funding |
This work was supported by the Department of Energy Grant Nos. DE-SC0016203 and NSF PHY-1461111. |
| Paper |
download TUPML025.PDF [0.448 MB / 4 pages] |
| Export |
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| Conference |
IPAC2018, Vancouver, BC, Canada |
| Series |
International Particle Accelerator Conference (9th) |
| Proceedings |
Link to full IPAC2018 Proccedings |
| Session |
MC3 Poster Session |
| Date |
01-May-18 16:00–17:30 |
| Main Classification |
03 Novel Particle Sources and Acceleration Technologies |
| Sub Classification |
T02 Electron Sources |
| Keywords |
cathode, electron, polarization, vacuum, photon |
| Publisher |
JACoW Publishing, Geneva, Switzerland |
| Editors |
Shane Koscielniak (TRIUMF, Vancouver, BC, Canada); Todd Satogata (JLab, Newport News, VA, USA); Volker RW Schaa (GSI, Darmstadt, Germany); Jana Thomson (TRIUMF, Vancouver, BC, Canada) |
| ISBN |
978-3-95450-184-7 |
| Published |
June 2018 |
| Copyright |
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