| Title |
Deposition and Characterization of TiZrHfV films by DC Magnetron Sputtering |
| Authors |
- X.Q. Ge, T.L. Hepresenter, X.T. Pei, Y.G. Wang, Y. Wang, W. Wei, B. Zhang, Y.X. Zhang
USTC/NSRL, Hefei, Anhui, People's Republic of China
|
| Abstract |
The new generation of accelerators places higher demands on the surfaces of vacuum chamber materials. Search for low secondary electron yield (SEY) materials and an effective vacuum chamber surface treatment process, which can effectively reduce the electronic cloud effect, are important early works for the new generation of accelerators. In this work, we revealed the SEY characteristics of Ti-Zr-Hf-V NEG films and Ti-Zr-V NEG films which were deposited on Si (111) substrates using direct current magnetron sputtering method. The surface morphology and surface chemical bonding information were collected by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). With the same parameters, the maximum SEY of Ti-Zr-Hf-V NEG films and Ti-Zr-V NEG films are 1.24 and 1.51, respectively. These results are of great significance for the next-generation particle accelerators.
|
| Paper |
download THPML129.PDF [0.981 MB / 3 pages] |
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| Conference |
IPAC2018, Vancouver, BC, Canada |
| Series |
International Particle Accelerator Conference (9th) |
| Proceedings |
Link to full IPAC2018 Proccedings |
| Session |
MC3/6/7 Poster Session |
| Date |
03-May-18 16:00–17:30 |
| Main Classification |
07 Accelerator Technology |
| Sub Classification |
T14 Vacuum Technology |
| Keywords |
vacuum, electron, controls, storage-ring, target |
| Publisher |
JACoW Publishing, Geneva, Switzerland |
| Editors |
Shane Koscielniak (TRIUMF, Vancouver, BC, Canada); Todd Satogata (JLab, Newport News, VA, USA); Volker RW Schaa (GSI, Darmstadt, Germany); Jana Thomson (TRIUMF, Vancouver, BC, Canada) |
| ISBN |
978-3-95450-184-7 |
| Published |
June 2018 |
| Copyright |
|
