| Title |
Production and Secondary Electron Yield Test of Amorphous Carbon Thin Film |
| Authors |
- Y.X. Zhang, X.Q. Ge, S.W. Wangpresenter, Y. Wang, W. Wei, B. Zhang
USTC/NSRL, Hefei, Anhui, People's Republic of China
|
| Abstract |
Amorphous carbon (a-C) thin film applied to vacuum chambers of high-energy particle accelerators can decrease secondary electron yield（SEY）and suppress electron-cloud effectively. A dc magnetron sputtering apparatus to obtain a-C film has been designed. With the equipment, a-C thin film can be deposited on the inner face of stainless steel pipes ultimately which is uniform and high-quality. Meanwhile, it is found that a-C has a low SEY＜1.2 measured by the secondary electron emission measurement set-up in the National Synchrotron Radiation Laboratory. The result indicates that a-C is an ideal material for modern accelerators.
|
| Paper |
download THPML128.PDF [1.191 MB / 3 pages] |
| Export |
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| Conference |
IPAC2018, Vancouver, BC, Canada |
| Series |
International Particle Accelerator Conference (9th) |
| Proceedings |
Link to full IPAC2018 Proccedings |
| Session |
MC3/6/7 Poster Session |
| Date |
03-May-18 16:00–17:30 |
| Main Classification |
07 Accelerator Technology |
| Sub Classification |
T14 Vacuum Technology |
| Keywords |
electron, vacuum, synchrotron, synchrotron-radiation, site |
| Publisher |
JACoW Publishing, Geneva, Switzerland |
| Editors |
Shane Koscielniak (TRIUMF, Vancouver, BC, Canada); Todd Satogata (JLab, Newport News, VA, USA); Volker RW Schaa (GSI, Darmstadt, Germany); Jana Thomson (TRIUMF, Vancouver, BC, Canada) |
| ISBN |
978-3-95450-184-7 |
| Published |
June 2018 |
| Copyright |
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