| Title |
Comparison Studies of Graphene Sey Results in NSRL and DL |
| Authors |
- J. Wang, Y. Wang, B. Zhang, Y.X. Zhang
USTC/NSRL, Hefei, Anhui, People's Republic of China
- B.S. Sian, R. Valizadeh
STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
- P.V. Tyagipresenter
STFC/DL, Daresbury, Warrington, Cheshire, United Kingdom
- R. Valizadeh, G.X. Xia
Cockcroft Institute, Warrington, Cheshire, United Kingdom
- G.X. Xia
UMAN, Manchester, United Kingdom
- G.L. Yu
University of Manchester, Manchester, United Kingdom
|
| Abstract |
Graphene has many excellent properties, such as high electron carrier mobility, good thermal conductivity and transparency etc. The secondary electron yield (SEY) of graphene with copper substrate had been studied in National Synchrotron Radiation Laboratory (NSRL) of China. The results show that the maximum SEY ('max) of 6~8 layers graphene film with copper substrates is about 1.25. Further studies indicate that many factors can affect the SEY test results. The recent SEY tests of graphene films with copper substrates in Daresbury Laboratory (DL) of UK gave the maximum SEY of as-received copper, graphene samples with copper substrates are 1.89, 1.83, and 1.68, respectively, under the incident charge per unit surface (Q) of 7.6×10⁻⁸ C 'mm-2. Meanwhile, the SEY test parameters and measurement results of graphene in both laboratories are compared and analysed. The effect of defects on the SEY results of graphene films with copper substrate is also discussed.
|
| Paper |
download WEPIK107.PDF [3.895 MB / 4 pages] |
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| Conference |
IPAC2017, Copenhagen, Denmark |
| Series |
International Particle Accelerator Conference (8th) |
| Proceedings |
Link to full IPAC2017 Proccedings |
| Session |
Posters Wednesday 2 |
| Date |
17-May-17 16:00–18:00 |
| Main Classification |
07 Accelerator Technology |
| Sub Classification |
T14 Vacuum Technology |
| Keywords |
electron, gun, factory, synchrotron, laser |
| Publisher |
JACoW, Geneva, Switzerland |
| Editors |
Volker RW Schaa (GSI, Darmstadt, Germany); Gianluigi Arduini (CERN, Geneva, Switzerland); Juliana Pranke (ESS, Lund, Sweden); Mike Seidel (PSI, Villigen, Switzerland); Mats Lindroos (ESS, Lund, Sweden) |
| ISBN |
978-3-95450-182-3 |
| Published |
May 2017 |
| Copyright |
|
