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DOI:10.18429/JACoW-IPAC2016-TUPMB007
Title Research and Development of the Pulse Bump Magnet for the Injection System in CSNS/RCS
Authors
  • L. Huo, M.Y. Huang, W. Kang, Y.Q. Liu, J. Qiu, L. Wang, S. Wangpresenter
    IHEP, Beijing, People's Republic of China
Abstract The H⁻ stripping painting injection is adopted in the Rapid Cycling Synchrotron (RCS) of China Spallation Neutron Source (CSNS). Painting injection is realized by eight pulse bump magnets. The pulse bump magnet is the key of the performance of painting, as well as the beam loss control. The manufacture and the field measurement of the eight pulse bump magnets have been completed. In the development of the magnets, some key technical problems on fabrication of coil were solved, and the field measurement results show that the magnets fulfil the design specification.
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Conference IPAC2016, Busan, Korea
Series International Particle Accelerator Conference (7th)
Proceedings Link to full IPAC2016 Proccedings
Session Poster Session
Date 10-May-16   16:00–18:00
Main Classification 07 Accelerator Technology
Sub Classification T09 Room-temperature Magnets
Keywords injection, neutron, radiation, high-voltage, synchrotron
Publisher JACoW, Geneva, Switzerland
Editors Christine Petit-Jean-Genaz (CERN, Geneva, Switzerland); Dong Eon Kim (PAL, Pohang, Republic of Korea); Kyung Sook Kim (PAL, Pohang, Republic of Korea); In Soo Ko (POSTECH, Pohang, Republic of Korea); Volker RW Schaa (GSI, Darmstadt, Germany)
ISBN 978-3-95450-147-2
Published June 2016
Copyright
Copyright © 2016 by JACoW, Geneva, Switzerland     CC-BY Creative Commons License
cc Creative Commons Attribution 3.0