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DOI:10.18429/JACoW-IPAC2016-THPMY016
Title Graphene Coating for the Reduction of the Secondary Electron Yield
Authors
  • B.S. Sian, G.X. Xia, G.L. Yu
    UMAN, Manchester, United Kingdom
  • I. Kinloch, L. Lin, V. Valles
    University of Manchester, Manchester, United Kingdom
  • O.B. Malyshev, R. Valizadehpresenter
    STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
  • O.B. Malyshev, R. Valizadehpresenter, G.X. Xia
    Cockcroft Institute, Warrington, Cheshire, United Kingdom
Abstract Secondary electron emission is a limiting factor for a performance of many instruments ranging from small gauges and detectors to waveguides and charged particle accelerators. There have been several methods of reducing this effect, e.g. the method of using a material with a low Secondary Electron Yield (SEY) or thin film coating with such a low SEY material. This paper describes the effect of SEY mitigation with graphene coatings on aluminium substrate. The maximum SEY (dmax) was decreased from 2.4 for bare aluminium to 1.4 with a graphene coating. Measurements were taken using an electron gun and a Faraday cup, the electron energies varied between 80 eV and 1 keV with a bias of -18 V on the sample. Other biases of -3, -5, -9, -25, -50 and -75 V were also tested however there was no effect on the SEY.
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Conference IPAC2016, Busan, Korea
Series International Particle Accelerator Conference (7th)
Proceedings Link to full IPAC2016 Proccedings
Session Poster Session
Date 12-May-16   16:00–18:00
Main Classification 07 Accelerator Technology
Sub Classification T14 Vacuum Technology
Keywords electron, cavity, vacuum, proton, framework
Publisher JACoW, Geneva, Switzerland
Editors Christine Petit-Jean-Genaz (CERN, Geneva, Switzerland); Dong Eon Kim (PAL, Pohang, Republic of Korea); Kyung Sook Kim (PAL, Pohang, Republic of Korea); In Soo Ko (POSTECH, Pohang, Republic of Korea); Volker RW Schaa (GSI, Darmstadt, Germany)
ISBN 978-3-95450-147-2
Published June 2016
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Copyright © 2016 by JACoW, Geneva, Switzerland     CC-BY Creative Commons License
cc Creative Commons Attribution 3.0