Cao, Jianshe
MOPCO22
HEPS beam charge measurement system
117
HEPS beam charge measurement includes bunch charge measurement system and average current meas-urement system. The injection scheme of HEPS requires charge monitor with high precision, stability, and a large dynamic range at each phase. This paper introduces the design and commissioning status of HEPS charge meas-urement system Signal reconstruction method applied in bunch charge measurement is also described in the paper.
  • Y. Zhao, J. Cao, J. He, J. Yue, L. W, T. Xu, Y. Sui, Y. Du
    Institute of High Energy Physics
Paper: MOPCO22
DOI: reference for this paper: 10.18429/JACoW-IBIC2025-MOPCO22
About:  Received: 03 Sep 2025 — Revised: 15 Sep 2025 — Accepted: 25 Sep 2025 — Issue date: 20 Jan 2026
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TUDC02
Beam profile measurement with pinhole camera and Kirkpatrick-Baez mirror at HEPS
The High Energy Photon Source (HEPS) is a 6 GeV electron storage ring light source currently under beam commissioning. We have designed a beam diagnostics beamline that integrates both pinhole imaging and KB mirror imaging systems, enabling the measurement of beam profiles and the calculation of beam sizes and emittance. Both systems are designed to measure the same source point, with the capability to switch between them for beam imaging. Currently, the measured emittance values are 91.8 pm in the horizontal and 4.9 pm in the vertical. This paper provides a detailed account of the measurement results from both imaging systems.
  • D. Zhu, W. Zhang, Y. Sui, J. Cao, J. Yue
    Institute of High Energy Physics
Slides: TUDC02
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