| Title |
Transportation and Manipulation of a Laser Plasma Acceleration Beam |
| Authors |
- A. Ghaith, T. André, I.A. Andriyash, F. Blache, F. Bouvet, F. Briquez, M.-E. Couprie, Y. Dietrich, J.P. Duval, C. Herbeaux, N. Hubert, C.A. Kitegi, M. Labat, N. Leclercq, A. Lestrade, A. Loulergue, O. Marcouillé, F. Marteau, D. Oumbarek, P. Rommeluère, E. Roussel, M. Sebdaoui, K.T. Tavakoli, M. Valléau
SOLEIL, Gif-sur-Yvette, France
- S. Bielawski, C. Evain, C. Szwaj
PhLAM/CERLA, Villeneuve d'Ascq, France
- S. Corde, J. Gautier, G. Lambert, B. Mahieu, V. Malka, K.T. Phuoc, C. Thaury
LOA, Palaiseau, France
|
| Abstract |
The ERC Advanced Grant COXINEL aims at demonstrating free electron laser amplification, at a resonant wavelength of 200 nm, based on a laser plasma acceleration source. To achieve the amplification, a 10 m long dedicated transport line was designed to manipulate the beam qualities. It starts with a triplet of permanent magnet with tunable gradient quadrupoles (QUAPEVA) that handles the highly divergent electron beam, a demixing chicane with a slit to reduce the energy spread per slice, and a set of electromagnetic quadrupoles to provide a chromatic focusing in a 2 m long cryogenic undulator. Electrons of energy 176 MeV were successfully transported throughout the line, where the beam positioning and dispersion were controlled efficiently thanks to a specific beam based alignment method, as well as the energy range by varying the slit width. Observations of undulator radiation for different undulator gaps are reported.
|
| Funding |
European Research Council advanced grant COXINEL - 340015 |
| Paper |
download TUA2WC01.PDF [1.868 MB / 6 pages] |
| Slides |
download TUA2WC01_TALK.PDF [2.465 MB] |
| Export |
download ※ BibTeX
※ LaTeX
※ Text/Word
※ RIS
※ EndNote |
| Conference |
FLS2018, Shanghai, China |
| Series |
ICFA Advanced Beam Dynamics Workshop (60th) |
| Proceedings |
Link to full FLS2018 Proccedings |
| Session |
WG-C |
| Date |
06-Mar-18 11:00–12:30 |
| Main Classification |
C - Compact Light Sources |
| Keywords |
ion, electron, laser, undulator, plasma |
| Publisher |
JACoW Publishing, Geneva, Switzerland |
| Editors |
Yong Ho Chin (KEK, Tsukuba, Japan); Zhentang Zhao (SINAP, Shanghai, China); Christine Petit-Jean-Genaz (CERN, Geneva, Switzerland); Volker RW Schaa (GSI, Darmstadt, Germany) |
| ISBN |
978-3-95450-206-6 |
| Published |
June 2018 |
| Copyright |
|
