| Title |
Start-to-end Simulations of the Reflection Hard X-Ray Self-Seeding at the SHINE Project |
| Authors |
- T. Liu, X. Dong, C. Feng
SARI-CAS, Pudong, Shanghai, People’s Republic of China
|
| Abstract |
The Shanghai high repetition rate XFEL and extreme light Facility (SHINE) project is designed to produce fully coherent X-ray photons covering the photon energy from 3 keV to 25 keV. We have reported our FEL proposal and schemes in the hard X-ray regime which is self-seeding based on the crystal monochromator previously. Comparing to the transmission self-seeding scheme, the reflection one has several advantages and might be the base proposal. Start-to-end (S2E) simulations from the beam generation by Astra, the linac accelerating by Elegant to the FEL simulation by Genesis are performed. In this manuscript, the FEL simulations based on the S2E beam will be presented mainly. The results demonstrate the feasibility of the reflection hard X-ray self-seeding at the SHINE project.
|
| Paper |
download TUP087.PDF [1.857 MB / 4 pages] |
| Export |
download ※ BibTeX
※ LaTeX
※ Text/Word
※ RIS
※ EndNote |
| Conference |
FEL2019 |
| Series |
Free Electron Laser Conference (39th) |
| Location |
Hamburg, Germany |
| Date |
26-30 August 2019 |
| Publisher |
JACoW Publishing, Geneva, Switzerland |
| Editorial Board |
Volker R.W. Schaa (GSI, Darmstadt, Germany); Winfried Decking (DESY, Hamburg, Germany); Harald Sinn (EuXFEL, Schenefeld, Germany); Gianluca Geloni (EuXFEL, Schenefeld, Germany); Siegfried Schreiber (DESY, Hamburg, Germany); Michaela Marx (DESY, Hamburg, Germany) |
| Online ISBN |
978-3-95450-210-3 |
| Online ISSN |
"" |
| Received |
20 August 2019 |
| Accepted |
29 August 2019 |
| Issue Date |
05 November 2019 |
| DOI |
doi:10.18429/JACoW-FEL2019-TUP087 |
| Pages |
254-257 |
| Copyright |
 Published by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI. |
|
