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https://doi.org/10.18429/JACoW-FEL2019-TUP063
Title Physical Design and FEL Performance Study for FEL-III Beamline of SHINE
Authors
  • N. Huang
    SINAP, Shanghai, People’s Republic of China
  • H.X. Deng, B. Liu, D. Wang
    SARI-CAS, Pudong, Shanghai, People’s Republic of China
Abstract The first hard X-ray free electron laser (XFEL) facility in China, the Shanghai High-Repetition-Rate XFEL and Extreme Light Facility (SHINE), is under construction, which allows for generating X-ray pulses in the photon energy range from 3 keV to 25 keV. To produce X-ray pulses with photon energy up to 25 keV, FEL-III undulator line of SHINE employs superconducting undulators. However, the smaller gap of the superconducting undulator poses serious wakefield effect reducing the FEL power, compared to the normal planar undulator. For a setup design optimization, the design and performance of the FEL-III undulator line are presented using start-to-end beam simulations at self-amplified spontaneous emission (SASE) and self-seeding mode. The wakefield impact on FEL performance is then investigated. A linear undulator tapering technique is adopted for recovering the FEL power to the non-wakefield level.
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Conference FEL2019
Series Free Electron Laser Conference (39th)
Location Hamburg, Germany
Date 26-30 August 2019
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Volker R.W. Schaa (GSI, Darmstadt, Germany); Winfried Decking (DESY, Hamburg, Germany); Harald Sinn (EuXFEL, Schenefeld, Germany); Gianluca Geloni (EuXFEL, Schenefeld, Germany); Siegfried Schreiber (DESY, Hamburg, Germany); Michaela Marx (DESY, Hamburg, Germany)
Online ISBN 978-3-95450-210-3
Online ISSN ""
Received 19 August 2019
Accepted 28 August 2019
Issue Date 05 November 2019
DOI doi:10.18429/JACoW-FEL2019-TUP063
Pages 199-202
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.