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| TUPB27 |
Recent Results from the Electron Beam Profile Monitor at the Swiss Light Source
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129 |
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- Å. Andersson
MAX-lab, Lund
- O. V. Chubar
SOLEIL, Gif-sur-Yvette
- A. Lüdeke, M. Rohrer, V. Schlott, A. Streun
PSI, Villigen
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Two different methods of beam profile measurements using a) visible-to-UV range synchrotron radiation and b) X-ray synchrotron radiation have been realized in a single diagnostics beam line at the Swiss Light Source (SLS). In the visible-to-UV case the vertically polarized synchrotron radiation renders an image heavily influenced by inherent emission and diffraction effects of synchrotron radiation. This nevertheless turns out to be an advantageous influence when determining rms beam profiles below 10 μm. However, high-precision wave-optics based calculations of the synchrotron light characteristics need to be performed (SRW-code) to ensure correct interpretation of the measured profiles. The visible-to-UV branch has a few built-in features allowing numerous cross-checks of the SRW-model. Surprisingly, wave-optics based calculations are also applicable, and required, for the X-ray pinhole camera setup. We briefly discuss the advantage of applying two different measuring techniques at the same source point. In total, for standard user operation at the SLS, the beam line has helped to establish a vertical emittance below 10 pmrad.
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