| Title |
Cyclotron Technology and Beam Dynamics for Microbeam Applications |
| Authors |
- S. Kurashima, H. Kashiwagi, N. Miyawaki, S. Okumura, T. Satoh, K. Yoshida, T. Yuyama
QST/Takasaki, Takasaki, Japan
- M. Fukuda
RCNP, Osaka, Japan
|
| Abstract |
We have been improving a beam quality of the TIARA (Takasaki Ion accelerators for Advanced Radiation Application) cyclotron to form a heavy-ion microbeam with a spot size about 1 μm. The microbeam is used to irradiate such as living cells and semiconductor devices. In order to form the microbeam using focusing lenses, an energy spread on the order of 10⁻⁴ is required to eliminate chromatic aberration in the focusing lenses. A flat-top acceleration system using the fifth-harmonic frequency of the acceleration frequency was installed in the cyclotron to reduce the energy spread. In addition, a new center region, a magnetic field stabilization system and an acceleration phase control technique were developed to provide the microbeam stably for beam users. The energy spread of a 260 MeV Ne beam was reduced to 0.05% by the flat-top acceleration, and the microbeam with a spot size of approximately 1 um was successfully formed. However it takes about 8 h to tune the cyclotron and the focusing lenses. A cocktail beam acceleration technique was introduced to quickly change the microbeam to the other one within 0.5 h, and several microbeams can be used in a beam time as a result.
|
| Paper |
download MOB01.PDF [1.024 MB / 5 pages] |
| Slides |
download MOB01_TALK.PDF [26.045 MB] |
| Conference |
Cyclotrons2016, Zurich, Switzerland |
| Series |
International Conference on Cyclotrons and Their Applications (21st) |
| Proceedings |
Link to full Cyclotrons2016 Proccedings |
| Session |
Beam Dynamics and Simulations |
| Date |
12-Sep-16 10:30–11:40 |
| Main Classification |
Cyclotron Applications |
| Keywords |
ion, cyclotron, acceleration, controls, vacuum |
| Publisher |
JACoW, Geneva, Switzerland |
| Editors |
Jan Chrin (PSI, Villigen, Switzerland); Jacobus M. Schippers (PSI, Villigen, Switzerland); Mike Seidel (PSI, Villigen, Switzerland); Volker RW Schaa (GSI, Darmstadt, Germany) |
| ISBN |
978-3-95450-167-0 |
| Published |
January 2017 |
| Copyright |
|
