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https://doi.org/10.18429/JACoW-IPAC2015-WEPWI016
Title Investigation of Differential Surface Removal due to Electropolishing at JLab
Authors
  • F. Marhauser, J. Follkie, C.E. Reece
    JLab, Newport News, Virginia, USA
Abstract Surface chemistry carried out for Superconducting Radio Frequency (SRF) cavities such as Buffered Chemical Polishing (BCP) and Electropolishing (EP) aims to uniformly remove the internal surface of a cavity along the entire structure and within each cell from equator to iris in order to obtain an equally etched surface. A uniform removal however is not readily achievable due to the complex fluid flow and varying temperatures of the acid mixture, which can lead to differential etching. This needs to be considered when envisaging a certain surface damage removal throughout the interior. The process-specific differential etching influences the target frequency set at the manufacturing stage as well as the field flatness and length of the as-built cavity. We report on analyses of JLab's present EP system using experimental data for six nine-cell cavities that have been processed recently in the frame of the LCLS-II high-Q development plan. In conjunction with numerical simulations, the differential etching and the impact on field flatness is assessed.
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Conference IPAC2015, Richmond, VA, USA
Series International Particle Accelerator Conference (6th)
Proceedings Link to full IPAC2015 Proccedings
Session Wednesday Posters (Wilson)
Date 06-May-15   16:00–18:00
Main Classification 7: Accelerator Technology
Sub Classification T07 - Superconducting RF
Keywords cavity, simulation, cathode, radio-frequency, SRF
Publisher JACoW, Geneva, Switzerland
Editors Stuart Henderson (ANL, Argonne, IL, USA); Evelyn Akers (Jlab, Newport News, VA, USA); Todd Satogata (JLab, Newport News, VA, USA); Volker R.W. Schaa (GSI, Darmstadt, Germany)
ISBN 978-3-95450-168-7
Published June 2015
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