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https://doi.org/10.18429/JACoW-IPAC2014-WEOAB01
Title The Commissioning of the Laser Ion Source for RHIC-EBIS
Authors
  • T. Kanesue, J.G. Alessi, E.N. Beebe, M.R. Costanzo, L. DeSanto, R.F. Lambiase, D. Lehn, C.J. Liaw, V. LoDestro, M. Okamura, R.H. Olsen, A.I. Pikin, D. Raparia, A.N. Steszyn
    BNL, Upton, Long Island, New York, USA
  • S. Ikeda
    TIT, Yokohama, Japan
  • K. Kondo, M. Sekine
    RLNR, Tokyo, Japan
Abstract A new laser ion source (LIS) for low charge state ion production was installed on RHIC-EBIS. This is the first LIS to be combined with an Electron Beam Ion Source (EBIS) type heavy ion source. The LIS provides intense low charge state ions from any solid state material, with low emittance and narrow pulse length. These features make it suitable as an external source of 1+ ions that can be injected into the EBIS trap for charge breeding. In addition, a LIS is the only type ion source which can allow rapid switching among many ion species, even on pulse-by-pulse basis, by changing either laser path or target position, to strike the material of choice. The EBIS works as a charge breeder, with the extracted high charge state ions used in the following accelerators. The beams from LIS will be used for RHIC and NASA Space Radiation Laboratory (NSRL) at BNL. The rapid beam switching, which was not possible with existing ion sources, will expand the research field at NSRL as a galactic cosmic ray simulator. The results of commissioning will be shown.
Funding Work supported by NASA and Brookhaven Science Associates, LLC under Contract No. DE-AC02-98CH10886 with the U.S. Department of Energy
Paper download WEOAB01.PDF [0.869 MB / 3 pages]
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Conference IPAC2014, Dresden, Germany
Series International Particle Accelerator Conference (5th)
Proceedings Link to full IPAC2014 Proccedings
Session Contributed Orals, Particle Sources and Alternative Acceleration Techniques
Date 18-Jun-14   09:30–10:30
Main Classification 03 Particle Sources and Alternative Acceleration Techniques
Sub Classification T01 Proton and Ion Sources
Keywords ion, laser, target, ion-source, injection
Publisher JACoW Publishing, Geneva, Switzerland
Editors Christine Petit-Jean-Genaz (CERN, Geneva, Switzerland); Gianluigi Arduini (CERN, Geneva, Switzerland); Peter Michel (HZDR, Dresden, Germany); Volker RW Schaa (GSI, Darmstadt, Germany)
ISBN 978-3-95450-132-8
Published July 2014
Copyright
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