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https://doi.org/10.18429/JACoW-IPAC2014-MOPRI009
Title Study on New Method for Generating Highly Charged Ions with Double Pulse Laser Ion Source
Authors
  • T. Shibuya
    TIT, Tokyo, Japan
  • N. Hayashizaki
    RLNR, Tokyo, Japan
  • M. Yoshida
    KEK, Ibaraki, Japan
Abstract Laser ion source capable of generating high intensity ions is best for the ion source of RI beam facilities. A great deal of effort has been made on particle number as DPIS. Only few attempts have so far been made at generating highly charged ions. One of previous research has reported that Au+53 ions are produced by PALS laser. "Nonlinear process" mechanisms such as resonance absorption and self-focusing were used for this. However, these methods have limitation due to low repetition rate of the laser. Nd (λ=1064nm, E<1.2J, t~10ns) and Yb laser(λ=1030nm, E<10J, t~500fs) systems is possible to operate at 10 - 50Hz repetition rate. This double pulse laser system, with attainable laser intensity up to about 1017[W/cm²], was used to generate highly charged ions of solid target. First, the Nd laser creates a plasma plume. Next, the Yb laser reheats plasma plume by high intensity pulse at delay time of nanosecond. The properties of ions were investigated mainly on the base of time-of-flight method.
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Conference IPAC2014, Dresden, Germany
Series International Particle Accelerator Conference (5th)
Proceedings Link to full IPAC2014 Proccedings
Session Poster Session, Ribery Area
Date 16-Jun-14   16:00–18:00
Main Classification 03 Particle Sources and Alternative Acceleration Techniques
Sub Classification T01 Proton and Ion Sources
Keywords laser, ion, plasma, ion-source, controls
Publisher JACoW Publishing, Geneva, Switzerland
Editors Christine Petit-Jean-Genaz (CERN, Geneva, Switzerland); Gianluigi Arduini (CERN, Geneva, Switzerland); Peter Michel (HZDR, Dresden, Germany); Volker RW Schaa (GSI, Darmstadt, Germany)
ISBN 978-3-95450-132-8
Published July 2014
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Copyright © 2014 by JACoW, Geneva, Switzerland     CC-BY Creative Commons License
cc Creative Commons Attribution 3.0