| Title |
Multi-Diagnostic Transverse Profile Monitor Chamber for Extreme Ultraviolet Lithography |
| Authors |
- T.J. Campese, R.B. Agustsson, M.A. Harrison, B.T. Jacobson, A.Y. Murokh, A.G. Ovodenko, M. Ruelas, H.L. To
RadiaBeam, Santa Monica, California, USA
- M.G. Fedurin, I. Pogorelsky, T.V. Shaftan
BNL, Upton, Long Island, New York, USA
|
| Abstract |
RadiaBeam Technologies has developed a compact transverse beam profile measurement system for the Extreme Ultraviolet Lithography (EUL) experiment at the Brookhaven National Laboratory-Accelerator Test Facility (BNL-ATF). The EUL experiment requires fine e-beam and laser alignment across multiple passes. To accomplish this, the system consists of four profile monitor diagnostics: Interaction Point (IP), upstream, downstream, and a sub-micron resolution diagnostic 11.5 mm downstream of the IP. Care was taken in the design to minimize footprint, avoid possible diagnostic collisions, and maximize ease of assembly and alignment. This paper will review the requirements for the dimensional and optical constraints and solutions for this experiment.
|
| Funding |
DOE SBIR Grant No DE-SC0007703 |
| Paper |
download TUPB085.PDF [0.533 MB / 3 pages] |
| Poster |
download TUPB085_POSTER.PDF [0.575 MB] |
| Conference |
IBIC2015, Melbourne, Australia |
| Series |
International Beam Instrumentation Conference (4th) |
| Proceedings |
Link to full IBIC2015 Proccedings |
| Session |
Poster Session 2 |
| Date |
15-Sep-15 16:00–18:00 |
| Main Classification |
Transverse Profile Monitors |
| Keywords |
diagnostics, laser, electron, target, experiment |
| Publisher |
JACoW, Geneva, Switzerland |
| Editors |
Mark Boland (SLSA, Clayton, Australia); David Button (ANSTO, Menai, Australia); Kathleen Riches (SLSA, Clayton, Australia); Volker RW Schaa (GSI, Darmstadt, Germany) |
| ISBN |
978-3-95450-176-2 |
| Published |
January 2016 |
| Copyright |
|
