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DOI:10.18429/JACoW-HIAT2015-WEPB25
Title Development of a Buffer Gas-Free Buncher for Low Energy RI Ion Beam
Authors
  • M. Togasaki, K. Kurita, K. Yamada
    Rikkyo University, Tokyo, Japan
  • M. Hara, T. Ohnishi, M. Wakasugi
    RIKEN Nishina Center, Wako, Japan
  • R. Toba
    Nagaoka University of Technology, Nagaoka, Niigata, Japan
Abstract In the SCRIT (Self-Confining RI Ion Target) electron scattering facility* at RIKEN RI Beam Factory, we constructed an ISOL-type RI beam generator named ERIS (Electron-beam-driven RI separator for SCRIT)**. ERIS supplys continuous RI ion beam with the energy of 50 keV at maximum. In order to efficiently inject the RI beam into the SCRIT device equipped in an electron storage ring, it is necessary to provide a 500-us pulsed ion beam without deteriorating of a vacuum level of less than 10⁻⁷ Pa. Therefore, we are developing a buffer gas-free buncher system working under the ultra-high vacuum based on a linear radiofrequency quadrupole (RFQ) trap. Our idea is to make active use of the fringing field at the entrance and the exit to decelerate and stack ions continuously injected into the buncher. Experiment for the performance study is now going on using the stable 133Cs and 23Na ions. In this paper, we will report the latest status of the development and the study of the buncher.
Footnotes & References *M. Wakasugi et. al, Nucl. Instr. Meth. B317, 668 (2013)
**T. Ohnishi et. al, Nucl. Instr. Meth. B317, 357 (2013)
Paper download WEPB25.PDF [0.141 MB / 3 pages]
Conference HIAT2015, Yokohama, Japan
Proceedings Link to full HIAT2015 Proccedings
Session Wednesday Poster Session (B)
Date 09-Sep-15   16:00–18:00
Main Classification Ion Sources, Traps, and Charge Breeding
Keywords ion, injection, rfq, electron, vacuum
Publisher JACoW, Geneva, Switzerland
Editors Osamu Kamigaito (RIKEN, Wako, Japan); Schaa, Volker R.W. (GSI, Darmstadt, Germany); Kazunari Yamada (RIKEN, Wako, Japan)
ISBN 978-3-95450-131-1
Published February 2016
Series Heavy Ion Accelerator Technology Conference (13th)
Copyright
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