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| Title | Challenges for the Next Generation ECRIS | |||||
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| Abstract | As an indispensible device to produce intense highly charged ion beams, ECR ion source has evolved into the 4th generation. Knowledge from the development of the 3rd generation ECR ion sources could provide valuable reference for the next generation machine design and fabrication, however there are still many challenges with regards to several key technical issues and physics approaches. This paper will review what we have learned from the state of the art ECR ion sources, and then critical aspects concerning the higher performance next generation ECR ion sources development will be discussed. | |||||
| Paper | download THM1I01.PDF [1.221 MB / 6 pages] | |||||
| Slides | download THM1I01_TALK.PDF [20.248 MB] | |||||
| Conference | HIAT2015, Yokohama, Japan | |||||
| Proceedings | Link to full HIAT2015 Proccedings | |||||
| Session | Thursday Morning Invited Oral 1 | |||||
| Date | 10-Sep-15 09:00–09:30 | |||||
| Main Classification | Ion Sources, Traps, and Charge Breeding | |||||
| Keywords | ECRIS, ion, ion-source, ECR, operation | |||||
| Publisher | JACoW, Geneva, Switzerland | |||||
| Editors | Osamu Kamigaito (RIKEN, Wako, Japan); Schaa, Volker R.W. (GSI, Darmstadt, Germany); Kazunari Yamada (RIKEN, Wako, Japan) | |||||
| ISBN | 978-3-95450-131-1 | |||||
| Published | February 2016 | |||||
| Series | Heavy Ion Accelerator Technology Conference (13th) | |||||
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