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DOI:10.18429/JACoW-ERL2015-MOPCTH010
Title Design Work of the ERL-FEL as the High Intense EUV Light Source
Authors
  • N. Nakamura, S. Chen, T. Furuya, K. Haga, I. Hanyu, K. Harada, T. Honda, Y. Honda, E. Kako, Y. Kamiya, R. Kato, H. Kawata, Y. Kobayashi, T. Konomi, T. Kubo, S. Michizono, T. Miyajima, H. Nakai, T. Obina, K. Oide, H. Sakai, S. Sakanaka, M. Shimada, K. Tsuchiya, K. Umemori, M. Yamamoto
    KEK, Ibaraki, Japan
  • R. Hajima, N. Nishimori
    JAEA, Ibaraki-ken, Japan
Abstract Energy recovery linac(ERL)-based free electron lasers(FELs) are promising candidates for high-power EUV sources. They can recover most acceleration energy from the electron beams and greatly reduce the dumped beam power and activation compared with those based on ordinary linear accelerators. We have investigated a feasible design of a 10-kW class ERL-FEL operated at 13.5 nm for EUV lithography applications. In this talk, we will present the design work of the ERL-FEL as the high-power EUV source.
Paper download MOPCTH010.PDF [2.259 MB / 6 pages]
Slides download MOPCTH010_TALK.PDF [4.589 MB]
Conference ERL2015, Stony Brook, NY, USA
Series ICFA Advanced Beam Dynamics Workshop on Energy Recovery Linacs (56th)
Proceedings Link to full ERL2015 Proccedings
Session Plenary Session 3: Operational Experience and Commissioning Results
Date 08-Jun-15   14:00–15:45
Main Classification WG6 ERLs
Keywords FEL, optics, linac, emittance, simulation
Publisher JACoW, Geneva, Switzerland
Editors Sergey Belomestnykh (FNAL, Batavia, IL, USA); Caitlin M. Hoffman (BNL, Brookhaven, NY, USA); Volker RW Schaa (GSI, Darmstadt, Germany)
ISBN 978-3-95450-183-0
Published September 2015
Copyright
Copyright © 2015 by JACoW, Geneva, Switzerland     CC-BY Creative Commons License
cc Creative Commons Attribution 3.0